Author:
Beale MIJ,Deshmukh VGI,Chew NG,Cullis AG
Cited by
8 articles.
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1. Reactions with Silicon;W Tungsten;1993
2. The Application of Ion Beam Mixing, Doped Silicide, and Rapid Thermal Processing to Self‐Aligned Silicide Technology;Journal of The Electrochemical Society;1990-02-01
3. Recent progress in refractory-metal silicide formation by ion beam mixing and its applications to VLSL;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-03
4. Influence of oxygen on the formation of WSi2 induced by ion beam mixing;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1988-06
5. Rapid isothermal processing;Journal of Applied Physics;1988-04-15