A Monte Carlo model for predicting the effective emissivity of the silicon wafer in rapid thermal processing furnaces

Author:

Zhou Y.H,Shen Y.J,Zhang Z.M,Tsai B.K,DeWitt D.P

Publisher

Elsevier BV

Subject

Fluid Flow and Transfer Processes,Mechanical Engineering,Condensed Matter Physics

Reference10 articles.

1. Rapid thermal processing technology for the 21st century;Timans;Mater. Sci. Semicond. Process.,1998

2. Surface temperature measurement using optical techniques;Zhang,2000

3. ITS-90 calibration of radiometers using wire/thin-film thermocouples in the NIST RTP tool: experimental procedures and results;Meyer,1999

4. Temperature measurement issues in rapid thermal processing;DeWitt;Mater. Res. Soc. Symp. Proc.,1997

5. An effective emissivity model for rapid thermal processing using the net-radiation method;Zhang;Int. J. Thermophys.,2001

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