Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching-Reference-Cited by-同舟云学术

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Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Published:2003-06 Issue: Volume:169-170 Page:203-207
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Tamura Masashi,Yoshikado Shinzo

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference4 articles.

1. K. Tajima, N. Kuwabara, F. Amemiya, R. Kobayashi, ICICE 76-B-II (1993) 538–545

2. K. Nishikawa, S. Furuichi, Technical Digest of 13th Sensor Symposium (1995) 105–108

3. Design of ultra-broad-band LiNbO/sub 3/ optical modulators with ridge structure

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