Mid-frequency reactive sputtering of dielectrics: Al2O3-Reference-Cited by-同舟云学术

Mid-frequency reactive sputtering of dielectrics: Al2O3

Published:2003-09 Issue: Volume:174-175 Page:88-93
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Belkind A.,Freilich A.,Song G.,Zhao Z.,Scholl R.,Bixon E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference32 articles.

1. Scholl, R., in 36th Annual Technical Conference Proceedings. 1993. Dallas: Society of Vacuum Coaters, p. 405

2. The deposition of aluminium oxide coatings by reactive unbalanced magnetron sputtering

3. Kirchoff, V., Kopte, T. in 39th Annual Technical Conference Proceedings. 1996. Philadelphia, PA: Society of Vacuum Coaters, p. 117

4. Schiller, S., Kirchoff, V., Goedicke, K., Frach, P., in 40th Annual Technical Conference Proceedings. 1997. New Orlean, LA: Society of Vacuum Coaters, p. 129

5. Hoetzch, G., Zywitzki, O., Sahm, H., in 40th Annual Technical Conference Proceedings. 1997. New Orlean, LA: Society of Vacuum Coaters, p. 77

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