Effects of ion bombardment and gas incorporation on the properties of Mo/a-Si:H multilayers for EUV applications

Author:

Rigato V.,Patelli A.,Maggioni G.,Salmaso G.,Mattarello V.,Pelizzo M.G.,Nicolosi P.,Depero L.,Bontempi E.,Mazzoldi P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference21 articles.

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3. J.M. Defise, X.Y. Song, J.P. Delaboudiniere, G.E. Artzner, C. Carabetian, J.F.E. Hochedez, J. Brunaud, J.D. Moses, R.C. Catura, F. Clette, A.J. Maucherat, in: S. Fineschi (Ed.). X-Ray and EUV/FUV Spectroscopy and Polarimetry, Proc. SPIE 2517, 29–39 (1995)

4. Soft x-ray projection lithography using an x-ray reduction camera

5. Soft X-Ray Optics;Spiller,1994

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