Refractive index control of core layer using PECVD and FHD for silica optical waveguide-Reference-Cited by-同舟云学术

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Refractive index control of core layer using PECVD and FHD for silica optical waveguide

Published:2003-07 Issue:1-3 Volume:171 Page:34-38
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kim Y.T.,Cho S.M.,Seo Y.G.,Yoon H.D.,Im Y.M.,Suh S.J.,Yoon D.H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference13 articles.

1. Planar optical waveguide thin films grown by microwave ECR PECVD

2. Interated optics;Righini,1995

3. Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hexamethyldisilazane

4. Performance evaluation of burst-based bandwidth-reservation method in ATM networks

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1. Research Progress in Preparation of Optical Thin Films by PECVD;Laser & Optoelectronics Progress;2020

2. Improving the Lot Fabrication Stability and Performance of Silica Optical Films during PECVD;Applied Sciences;2019-02-22

3. Optimized-geometry ARROW waveguides using TiO2as anti-resonant layer;physica status solidi (c);2010-03-01

4. Fabrication of Metal-insulator-metal Capacitors with SiNxThin Films Deposited by Plasma-enhanced Chemical Vapor Deposition;Transactions on Electrical and Electronic Materials;2009-10-31

5. a-SiC:H anti-resonant layer ARROW waveguides;Journal of Optics A: Pure and Applied Optics;2008-08-27

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