Structure/mechanical properties relationship of titanium–oxygen coatings reactively sputter-deposited
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Deposition of High-Quality TiO2Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet
2. Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature
3. Correlation between the density of TiO2 films and their properties
4. Mechanical and electrical properties of fcc TiO1+x thin films prepared by r.f. reactive sputtering
5. Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering
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4. Effect of energy on macrostress in Ti(Al,V)N films prepared by magnetron sputtering;Vacuum;2018-12
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