A study of lead zirconate titanate etching characteristics using magnetized inductively coupled plasmas
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Characterization of thick lead zirconate titanate films fabricated using a new sol gel based process
2. Piezoelectric properties of c-axis oriented Pb(Zr,Ti)O3 thin films
3. Chemical etching of thin film PLZT
4. PLZT thin-film waveguides
5. Reactive ion beam etching of PLZT electrooptic substrates with repeated self-aligned masking
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1. Hybrid simulation of radio frequency biased inductively coupled Ar/O<sub>2</sub>/Cl<sub>2</sub> plasmas;Acta Physica Sinica;2024
2. Inductively coupled plasmas (ICP) etching of PZT thin films for fabricating optical waveguide with photoresist/aluminum bilayer masking;SPIE Proceedings;2015-02-27
3. Etching Characteristics and Mechanisms of Pb(Zr,Ti)O3, Pt, and SiO2in an Inductively Coupled HBr/Cl2Plasma;Japanese Journal of Applied Physics;2011-06-20
4. Etching Characteristics and Mechanisms of Pb(Zr,Ti)O3, Pt, and SiO2in an Inductively Coupled HBr/Cl2Plasma;Japanese Journal of Applied Physics;2011-06-01
5. Fabrication and Electromechanical Properties of Pb(Zr0.52,Ti0.48)O3 Micro-Diaphragm;Integrated Ferroelectrics;2005-01-01
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