Characterization of large area filtered arc deposition technology: part I — plasma processing parameters-Reference-Cited by-同舟云学术

Characterization of large area filtered arc deposition technology: part I — plasma processing parameters

Published:2001-05 Issue:2 Volume:140 Page:82-92
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Gorokhovsky Vladimir I.,Bhattacharya Rabi,Bhat Deepak G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference17 articles.

1. Vacuum Arc Science and Technology,1995

2. Recent progress in filtered vacuum arc deposition

3. Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review

4. D. Baldwin, S. Falabella, Deposition processes utilizing a new filtered cathodic-arc source, in: D. Mattox (Ed.). Proceedings of the Thirty-eighth Annual Technical Conference of the Society of Vacuum Coaters, 1995, pp. 309–316.

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