Parametric effects of residual stress in pulsed d.c. plasma enhanced CVD TiN coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. Microstructural characterization of chemically vapor deposited TiN coating
2. Formation of nanocrystalline TiN film by ion-beam-enhanced deposition
3. Effect of ion implantation on the residual stress, tribological and machining behavior of CVD and PVD TiN coated cemented carbide cutting tool inserts
4. Formation of TiN films with low Cl concentration by pulsed plasma chemical vapor deposition
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3. Caracteristics of TiN Coating Films for Large Sizes Prepared by Arc Ion Plating;Materials Science Forum;2012-01
4. Effects of Technical Elements on Microstructure and Hardness of TiAlN/TiN Coatings;Applied Mechanics and Materials;2011-08
5. Sliding Friction and Wear Test of TiAlN TiN Films and 40Cr Steel;Advanced Materials Research;2011-02
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