The use of a high-voltage discharge at low pressure for 3D ion implantation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The use of a high-voltage discharge at low pressure for 3D ion implantation

Published:1997-11 Issue:1 Volume:96 Page:68-74
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Khvesyuk Vladimir I.,Tsygankov Piotr A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference10 articles.

1. Method and apparatus for plasma source ion implantation;Conrad,1988

2. Plasma source ion implantation: a new approach to ion beam modification of materials;Conrad;Mater. Sci. Eng.,1987

3. The ignition of a high voltage discharge at low pressure of hydrogen;Pokrovskaya-Soboleva;Russ. J. Appl. Phys.,1957

4. High voltage glow discharge in D2 gas. Diagnostic measurements;McClure;Phys. Rev.,1961

5. Plasma Processes in the Electron Guns for Technological Applications;Zavialov,1989

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental corrosion resistance evaluation of Cr–Mo-Mn steel surface modified with titanium and nitrogen ions;Emergent Materials;2024-01-04

2. Temperature estimation using Boltzmann plot method of titanium emission lines produced on electric arc discharge;Journal of Physics: Conference Series;2021-10-01

3. Analysis of the concentration of nitrogen and titanium ions simultaneously implanted into chromium-molybdenum low-alloy carbon steel;Journal of Physics: Conference Series;2021-10-01

4. Electrochemical Behavior of a Stainless Steel Superficially Modified with Nitrogen by Three-dimensional Ion Implantation;Ingeniería e Investigación;2021-08-20

5. Analysis of the titanium ions concentration implanted in low alloy steel;Journal of Physics: Conference Series;2021-05-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3