1. Pulsed Magnetron DC Sputtering Technology;Schiller,1993
2. Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias by W. Olbrich;Fessman;Surf. Coat. Technol.,1991
3. J. Schneider, W. Sproul, A. Lefkow, Birl, A. Matthews, U. Hull, Scaleable Process for Pulsed DC Magnetron Sputtering of Non-Conductive Oxides, 39th 1996 SUC Tech. Conf. Proceedings, Philla. PA p. 168.
4. Alumina-chromica coatings deposited by reactive magnetron sputtering. J.M. Schneider, W.D. Sproul, Birl, Northwestern University, Evanston IL; J. Sellers, ENI-SW, Austin, TX and A. Mathews, RCSE, Hull University, United kingdom. 1997 Society of Vacuum Coaters, 40th Technical Conference Proceedings