Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference15 articles.
1. Electronic Band Structure of Al2O3, with Comparison to Alon and AIN
2. Alumina deposition by activated reactive evaporation
3. Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2System
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