Automatic Langmuir probe measurement in a magnetron sputtering system-Reference-Cited by-同舟云学术

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Automatic Langmuir probe measurement in a magnetron sputtering system

Published:1999-09 Issue: Volume:116-119 Page:1083-1088
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Spolaore M.,Antoni V.,Bagatin M.,Buffa A.,Cavazzana R.,Desideri D.,Martines E.,Pomaro N.,Serianni G.,Tramontin L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference10 articles.

1. Unbalanced magnetrons and new sputtering systems with enhanced plasma ionization

2. Charged particle fluxes from planar magnetron sputtering sources

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements;Journal of Vacuum Science & Technology A;2024-02-02

2. Analysis on TIG Arc During Welding of Magnesium Alloy Sheet by a Combination of Spectral Diagnosing and Langmuir Probe Detection;IEEE Transactions on Plasma Science;2023-08

3. Discharge characteristics of electronegative Mg–CF4 direct current magnetron sputtering by probe measurements;Journal of Applied Physics;2021-06-21

4. Physics and technology of magnetron sputtering discharges;Plasma Sources Science and Technology;2020-11-01

5. Optical detection of CO gas by the surface-plasmon resonance of Ag nanoparticles and nanoclusters synthesized on a hydrogenated amorphous carbon (a-C:H) film;The European Physical Journal Plus;2019-07

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