Characterization of tantalum oxide films grown by pulsed laser deposition-Reference-Cited by-同舟云学术

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Characterization of tantalum oxide films grown by pulsed laser deposition

Published:1999-11 Issue: Volume:120-121 Page:757-764
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Boughaba S.,Islam M.U.,Sproule G.I.,Graham M.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference44 articles.

1. Promising storage capacitor structures with thin Ta/sub 2/O/sub 5/ film for low-power high-density DRAMs

2. UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs

3. Chemical Perspectives of Microelectronic Materials III;Treichel,1993

4. Tantalum pentoxide for advanced DRAM applications

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5. Influence of magnetron sputtering conditions on the chemical bonding, structural, morphological and optical behavior of Ta1−xOx coatings;Surface and Coatings Technology;2018-01

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