Ion beam assisted deposition of tantalum nitride thin films for vacuum microelectronics devices

Author:

Gotoh Y,Kagamimori K,Tsuji H,Ishikawa J

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference16 articles.

1. Transition metal carbides and nitrides;Toth,1979

2. G.V. Fomenko, Handbook of Electron Emission Property (Nisso Tsushinsha Trans.) (Nisso Tsushinsha, Wakayama, 1973) [in Japanese].

3. Field emission from ZrC and ZrC films on Mo field emitters

4. Hafnium carbide films and film-coated field emission cathodes

5. Field emission characteristics of transition-metal nitrides

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