Microstructure and mechanical properties of cathodic arc ion-plated (Al,Ti)N coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. On structure and properties of sputtered Ti and Al based hard compound films
2. The structure and composition of TiZrN, TiAlZrN and TiAlVN coatings
3. Titanium aluminum nitride films: A new alternative to TiN coatings
4. Wear mechanisms of (Ti1 − x,Alx)N coatings in dry drilling
5. Microstructure and physical properties of polycrystalline metastable Ti0.5Al0.5N alloys grown by d.c. magnetron sputter deposition
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1. Control of the preferential orientation and properties of HiPIMS and DCMS deposited chromium coating based on bias voltage;Vacuum;2024-09
2. Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values;Journal of Vacuum Science & Technology A;2024-05-29
3. In-situ monitoring of stress evolution in high power impulse magnetron sputtering-deposited Ti-Al-N films: Effect of substrate bias and temperature;Thin Solid Films;2023-11
4. Screening of the FeCrAl LBE corrosion-resistant coatings: The effect of Cr and Al contents;Surface and Coatings Technology;2023-06
5. Influence of substrate bias on machining performance of TiAlN-coated drill bits;Materials and Manufacturing Processes;2023-03-13
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