High-temperature oxidation resistance of Cr1−Al N thin films deposited by reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Characteristics of (Cr1-x, Alx)N Films Prepared by Pulsed Laser Deposition
2. Oxidation behavior of CrNx and (Cr,Al)Nx hard coatings
3. Synthesis of pseudobinary Cr-Al-N films with B1 structure by rf-assisted magnetron sputtering method
4. Phase transition of pseudobinary Cr–Al–N films deposited by magnetron sputtering method
5. (Cr:Al)N coatings deposited by the cathodic vacuum are evaporation
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