Effects of carbon incorporation in tungsten carbide films deposited by r.f. magnetron sputtering: single layers and multilayers-Reference-Cited by-同舟云学术

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Effects of carbon incorporation in tungsten carbide films deposited by r.f. magnetron sputtering: single layers and multilayers

Published:2003-01 Issue: Volume:163-164 Page:386-391
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Rincón C,Romero J,Esteve J,Martı́nez E,Lousa A

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference13 articles.

1. Carbide, Nitride and Boride Materials—Synthesis and Processing,1997

2. Preparation of single phase tungsten carbide by annealing of sputtered tungsten-carbon layers

3. Reactive and non-reactive high rate sputter deposition of Tungsten carbide

4. Failure modes observed on worn surfaces of W-C-Co sputtered coatings

5. Synthesis of tungsten carbide films by rf magnetron sputtering

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3. Electrical and Structural Properties of Non-Reactive Dual Magnetron Sputter Deposited W–C Thin Films for MOSFET Gates;Russian Journal of Physical Chemistry A;2021-05

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