The deposition of hard crystalline Al2O3 layers by means of bipolar pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference10 articles.
1. Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2System
2. Transitions in Vapor-Deposited Alumina from 300o to 1200oC
3. Alumina deposition by activated reactive evaporation
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