Low temperature plasma production of hydrogenated nanocrystalline silicon thin films-Reference-Cited by-同舟云学术

Low temperature plasma production of hydrogenated nanocrystalline silicon thin films

Published:2013-01 Issue:1 Volume:13 Page:181-188
ISSN:1567-1739
Container-title:Current Applied Physics
language:en
Short-container-title:Current Applied Physics

Author:

Anutgan Tamila,Uysal Sema

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference38 articles.

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2. Nanocrystalline silicon thin films on PEN substrates

3. Substrate temperature dependence of microcrystalline silicon growth by PECVD technique

4. Structural, optical, and electrical properties of nanocrystalline silicon films deposited by hydrogen plasma sputtering

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