Parametric study on excitation temperature and electron temperature in low pressure plasmas
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Materials Science
Reference19 articles.
1. Characteristics of an atmospheric microwave-induced plasma generated in ambient air by an argon discharge excited in an open-ended dielectric discharge tube
2. Parametric study of an atmospheric pressure microwave-induced plasma of the mini MIP torch — II. Two-dimensional spatially resolved excitation temperature measurements
3. On the use of the line-to-continuum intensity ratio for determining the electron temperature in a high-pressure argon surface-microwave discharge
4. Measurement of electron energy distribution in low-pressure RF discharges
5. Spectroscopic measurement of electron temperature and density in argon plasmas based on collisional-radiative model
Cited by 41 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of antenna helicity on discharge characteristics of helicon plasma under a divergent magnetic field;Plasma Science and Technology;2024-06-01
2. Characteristics of Aqueous Chemical Species Generation in Plasma‐Facing Liquid Systems Using Helium Jet Plasma;ChemistryOpen;2024-05-27
3. Effect of plasma modulation on the nucleation and crystal evolution of nanodiamond seeds during CVD diamond growth;Journal of Crystal Growth;2024-02
4. Plasma Ion Bombardment Induced Heat Flux on the Wafer Surface in Inductively Coupled Plasma Reactive Ion Etch;Applied Sciences;2023-08-23
5. Investigations on plasma parameters of diaphragm discharge plasma based on optical emission spectroscopy;Japanese Journal of Applied Physics;2023-05-04
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3