Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma-Reference-Cited by-同舟云学术

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Thin-film deposition modeling of hydrogenated amorphous silicon in the afterglow of argon plasma

Published:2013-12 Issue: Volume:88 Page:872-883
ISSN:0045-7930
Container-title:Computers & Fluids
language:en
Short-container-title:Computers & Fluids

Author:

Chau S.W.,Pham Q.T.,Nguyen M.N.

Publisher

Elsevier BV

Subject

General Engineering,General Computer Science

Reference28 articles.

1. Low pressure plasmas and microstructuring technology;Franz,2009

2. Plasma deposition processes of amorphous silicon-based materials;Bruno,1995

3. Plasma chemistry;Fridman,2008

4. Principles of plasma discharges and materials processing;Lieberman,2005

5. Park, JH. Deposition of coatings by PECVD. Department of Electrical Engineering, Auburn University; 2003.

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2. Spatial distribution study of a nitrogen plasma in an ion-filtered inductively coupled plasma used to grow GaN films;Journal of Physics D: Applied Physics;2019-07-22

3. Modeling and simulation of ion-filtered inductively coupled plasma using argon plasma;Japanese Journal of Applied Physics;2015-02-04

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