Degradation of phenol using low concentration of ferric ions by the photo-Fenton process
Author:
Publisher
Elsevier BV
Subject
General Chemical Engineering,General Chemistry
Reference30 articles.
1. Treating Chemical Industries Influent Using Aerobic Granular Sludge: Recent Development;Adav;J. Taiwan Inst. Chem. Engrs.,2009
2. Advanced Oxidation of Phenolic Compounds;Alnaizy;Adv. Environ. Res.,2000
3. Advanced Oxidation Processes (AOP) for Water Purification and Recovery;Andreozzi;Catal. Today,1999
4. Advanced Oxidation of Acid and Reactive Dyes: Effect of Fenton Treatment on Aerobic, Anoxic and Anaerobic Processes;Arslan-Alaton;Dyes Pigm.,2008
5. Photochemical Degradation and Mineralization of Phenol: A Comparative Study;Bali;J. Environ. Sci. Health A.,2003
Cited by 52 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Recent developments in moving bed biofilm reactor (MBBR) for the treatment of phenolic wastewater -A review;Journal of the Taiwan Institute of Chemical Engineers;2024-05
2. The Grey–Taguchi Method, a Statistical Tool to Optimize the Photo-Fenton Process: A Review;Water;2023-07-25
3. Efficient Removal Performance of COD in Real Laundry Wastewater via Conventional and Photo-Fenton Degradation Systems: A Comparative Study on Oxidants and Operating Time by H2O2/Fe2+;Arabian Journal for Science and Engineering;2023-02-13
4. Amorphous iron oxides anchored on BiOCl nanoplates as robust catalysts for high-performance photo-Fenton oxidation;Journal of Colloid and Interface Science;2022-09
5. The principle of detailed balancing, the iron-catalyzed disproportionation of hydrogen peroxide, and the Fenton reaction;Dalton Transactions;2022
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3