Author:
Maeda Minoru,Nakamura Kazuo,Ohkubo Tsutomu,Ito Masaru,Ishii Eiichi
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference30 articles.
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4. Thermodynamics and kinetics of oxidation of hot-pressed silicon nitride;Singhal;J. Mater. Sci.,1976
5. Oxidation of Si3N4 in the range 1300° to 1500°C;Tripp;J. Am. Ceram. Soc.,1976
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