Optical Linewidth Measurements on Photomasks and Wafers† †Contribution of the National Bureau of Standards; not subject to copyright.
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Elsevier
Reference47 articles.
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2. J. M. Jerke, Semiconductor Measurement Technology: Accurate Linewidth Measurements on Integrated-Circuit Photomasks, National Bureau of Standards Special Publication 400–43, p. 7 (February 1980).
3. Precise Measurement by Image-Splitting
4. G. W. Deberko, unpublished paper presented at SEMICON/WEST Show, San Mateo, California (May 26, 1976).
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