A novel organic bottom anti-reflective coating material for 193nm excimer laser lithography
Author:
Publisher
Elsevier BV
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference13 articles.
1. ArF Single Layer Resist Composed of Alicyclic Main Chain Containing Maleic Anhydride.
2. Alicyclic Polymers for 193 nm Resist Applications: Lithographic Evaluation
3. Alicyclic Polymers for 193 nm Resist Applications: Synthesis and Characterization
4. Fabrication of0.13-µmDevice Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques
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2. A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography;AIP Advances;2020-04-01
3. The effects of the bottom anti-reflective coating with different baked temperatures and thicknesses on nanoscale patterns;Applied Surface Science;2015-12
4. Thickness optimization for lithography process on silicon substrate;Advances in Patterning Materials and Processes XXXII;2015-03-20
5. Nanopatterning by Laser Interference Lithography: Applications to Optical Devices;Journal of Nanoscience and Nanotechnology;2014-02-01
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