Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist
Author:
Publisher
Elsevier BV
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference11 articles.
1. Synthesis and polymerization of 3-(t-butoxycarbonyl)-1-vinylcaprolactam and application as deep UV resists
2. A novel water developable photoresist for deep UV lithography
3. Deep UV photoresists based on poly(dl-tert-butyl fumarate)
4. Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials
5. Mechanism of Resist Pattern Collapse during Development Process
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2. Studies on photolithography and photoreaction of copolymer containing naphthyl in ultrathin nanosheets induced by deep UV irradiation;Journal of Photochemistry and Photobiology A: Chemistry;2008-02
3. Synthesis, Characterization and Photocrosslinking Properties of Poly(1‐(4‐Methacrylamidophenyl)‐1‐(4‐nitrophenyl)prop‐1‐en‐3‐one);Journal of Macromolecular Science, Part A;2006-08
4. Synthesis, characterization and properties of photoresponsive polymers comprising photocrosslinkable pendant chalcone moieties;Polymer International;2006
5. Negative Photoresist Materials Based on Poly(Norbornene Derivatives‐co‐styrene‐co‐maleic Anhydride);Journal of Macromolecular Science, Part A;2005-03
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