The effect of nitrogen on the microstructure, stress, and magnetic properties of RF-sputtered FeSiAl(N) thin films-Reference-Cited by-同舟云学术

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The effect of nitrogen on the microstructure, stress, and magnetic properties of RF-sputtered FeSiAl(N) thin films

Published:2001-05 Issue: Volume:226-230 Page:1669-1671
ISSN:0304-8853
Container-title:Journal of Magnetism and Magnetic Materials
language:en
Short-container-title:Journal of Magnetism and Magnetic Materials

Author:

Snyder J.E,Lo C.C.H,Chen R,Kriegermeier-Sutton B,Leib J,Lee S.J,Kramer M.J,Jiles D.C,Kief M.T

Publisher

Elsevier BV

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Microstructural origin of soft magnetic properties of sendust films prepared by N2 reactive sputtering

2. Preparation of soft, anisotropic sendust films in the as-deposited state

3. Physics of Thin Films;Eckertova,1986

4. Properties of Silicon;Ma,1988

5. A New Type of Magnetic Domain Structure in Negative Magnetostriction Ni-Fe Films

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Polycrystalline iron nitride films fabricated by reactive facing-target sputtering: Structure, magnetic and electrical transport properties;Journal of Applied Physics;2011-09

2. Domain structures of nanocrystalline Fe78Si10B12 thin films;Applied Surface Science;2005-05

3. Magnetic properties and domain structures of FeSiB thin films;Surface Science;2004-05

4. Magnetic and electrical properties of iron nitride films containing both amorphous matrices and nanocrystalline grains;Science and Technology of Advanced Materials;2004-01

5. Influence of nanostructure and nitrogen content on the optical and electrical properties of reactively sputtered FeSiAl(N) films;Journal of Applied Physics;2003-08-15

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