Microstructure and noise characteristics of Co–Cr–Ta films deposited in low Ar pressure
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Perpendicular Co–Cr thin films using a new sputtering plasma generating apparatus
2. Microstructure and noise characteristics of Co-Cr-Ta films on ultraflat glass substrates for longitudinal recording disks
3. Noise origin of Co–Cr–Ta films on ultra-flat glass-ceramic and Si substrates for longitudinal recording disks
4. Preparation of amorphous carbon films as protective layer by FTS system
5. Deposition of high-durability protective layers with a composite structure of DLC and GLC by facing-targets sputtering
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