Synergetic effects of Bi5+ and oxygen vacancies in Bismuth(V)-rich Bi4O7 nanosheets for enhanced near-infrared light driven photocatalysis
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Polymers and Plastics,Mechanical Engineering,Mechanics of Materials,Ceramics and Composites
Reference47 articles.
1. Tuning of Persulfate Activation from a Free Radical to a Nonradical Pathway through the Incorporation of Non-Redox Magnesium Oxide
2. Bi quantum dots implanted 2D C-doped BiOCl nanosheets: Enhanced visible light photocatalysis efficiency and reaction pathway
3. Synergistic effects of crystal structure and oxygen vacancy on Bi2O3 polymorphs: intermediates activation, photocatalytic reaction efficiency, and conversion pathway
4. Solar Water Splitting and Nitrogen Fixation with Layered Bismuth Oxyhalides
Cited by 45 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Facilely prepared Bi4O7 modified commercial Ga2O3 with optimized photocatalytic efficiency for perfluorooctanoic acid degradation;Applied Surface Science;2024-11
2. Synthesis and characterization of CuCoFe2O4@GA/AC as a bio-based matrix magnetic nano-heterogeneous photocatalyst for ceftriaxone degradation from aqueous media;Applied Water Science;2024-08-13
3. A perspective on bismuth based materials for the photodegradation of organic pollutants;Environmental Nanotechnology, Monitoring & Management;2024-05
4. Effects of Bi on microstructure and corrosion behavior of Zr-1 Nb alloy in 500 °C/10.3 MPa superheated steam;Corrosion Science;2024-04
5. Strategies for boosting the photocatalytic reduction of toxic metal ions: Progress and prospects;Journal of Water Process Engineering;2024-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3