Laser ablation mechanism of ZrC-SiC-MoSi2 ternary ceramic modified C/C-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Laser ablation mechanism of ZrC-SiC-MoSi2 ternary ceramic modified C/C

Published:2023-06 Issue: Volume:149 Page:214-224
ISSN:1005-0302
Container-title:Journal of Materials Science & Technology
language:en
Short-container-title:Journal of Materials Science & Technology

Author:

Geng Li,Cheng Su,Liu Guanghai,Fu Qiangang,Li Hejun

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Polymers and Plastics,Mechanical Engineering,Mechanics of Materials,Ceramics and Composites

Reference49 articles.

1. Academician Basov, high-power lasers and the antimissile defence problem

2. Proceedings of the AIP Conference;Cook,2005

3. Proceedings of the SPIE Free-Electron Laser Challenges;Cook,1997

4. Laser ablation behavior of C/SiC composites subjected to transverse hypersonic airflow

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Progress in aerospace materials and ablation resistant Coatings: A focused review;Optics & Laser Technology;2024-10

2. Laser ablation behavior and mechanisms of 3D carbon fiber reinforced ZrB2-SiC composite;Corrosion Science;2024-08

3. Novel high-entropy ultra-high temperature ceramics with enhanced ablation resistance;Rare Metals;2024-07-22

4. Recycling of MoSi2-based industrial solid wastes for the fabrication and high-temperature oxidation behavior of MoSi2–ZrSi2–SiC composite coating;Composites Part B: Engineering;2024-04

5. Mechanical and ablation properties of Cf/SiBCN-ZrB2 composites prepared by an in-situ reaction: Effect of carbon source;Journal of the European Ceramic Society;2024-03

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3