Correlation of particle flux parameters with the properties of thin tungsten carbide films-Reference-Cited by-同舟云学术

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Correlation of particle flux parameters with the properties of thin tungsten carbide films

Published:1991-07 Issue: Volume:139 Page:137-143
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Keller G.,Barzen I.,Dötter W.,Erz R.,Ulrich S.,Jung K.,Ehrhardt H.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference15 articles.

1. High Rate Thick Film Growth

2. Revised structure zone model for thin film physical structure

3. Ion beam bombardment effects during films deposition

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1. Tungsten Carbides;Ultra-High Temperature Materials IV;2022

2. Control of the structure and stress state of thin films and coatings in the process of their preparation by ion-plasma methods;Physics of the Solid State;2011-07

3. Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films;Surface and Coatings Technology;2011-07

4. Structural investigation by the Rietveld method of sputtered tungsten carbide thin films;Thin Solid Films;2009-01

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