Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature using a pulsed bias voltage
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference12 articles.
1. Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum
2. Structure, internal stresses, adhesion and wear resistance of sputtered alumina coatings
3. Anwenderbezogene ESCA-Oberfl�chenuntersuchungen in der industriellen Technik
4. TixAl1−xN films deposited by ion plating with an arc evaporator
5. Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings
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1. A tailored pulsed substrate bias voltage deposited (a-C: Nb) thin-film coating on GTD-450 stainless steel: Enhancing mechanical and corrosion protection characteristics;Chemical Engineering Journal;2021-01
2. Physical vapor deposition technology for coated cutting tools: A review;Ceramics International;2020-08
3. Effect of Pulsed Biasing on the Droplet Formation and the Properties of Cylindrical Cathodic Arc–Grown Erosion-Resistant TiN Coatings;Tribology Transactions;2018-11-20
4. Microstructure and residual stress of TiN films deposited at low temperature by arc ion plating;Transactions of Nonferrous Metals Society of China;2018-07
5. Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias;Plasma Science and Technology;2013-06
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