Finite element method applied to stress simulation of high power 980nm pump lasers-Reference-Cited by-同舟云学术

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Finite element method applied to stress simulation of high power 980nm pump lasers

Published:1997-10 Issue:10-11 Volume:37 Page:1667-1670
ISSN:0026-2714
Container-title:Microelectronics Reliability
language:en
Short-container-title:Microelectronics Reliability

Author:

Manna M.,Magistrali F.,Maini M.,Reichenbach D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. F. Magistrali et al., “Qualification Testing and Field Reliability Results of 980 nm Pump Lasers”, OFC 95, S. Diego, California

2. Formulae for stress and strain 6/e;Young,1989

3. Thermal Stresses and cracking resistance of dielectric films (SiN, Si3N4 and SiO2) on Si substrates,1978

4. Semiconductor material and device Characterization;Schroder,1990

5. Electron mobility in Alx Ga1−xAs;Stringfellow;J. Appl. Phys.,1979

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3. Heat transfer and residual stress modeling of a diamond film heat sink for high power laser diodes;IEEE Transactions on Components and Packaging Technologies;2003-09

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