IR induced photochemistry of glycolaldehyde in nitrogen matrix
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference40 articles.
1. Isomerization of Nitrous Acid: An Infrared Photochemical Reaction
2. Infrared Induced Conformer Interconversion Processes in Low-Temperature Matrices
3. Rotational Isomerism of Ethanol and Matrix Isolation Infrared Spectroscopy
4. Infrared-Induced Isomerization of Ethanol Dimers Trapped in Argon and Nitrogen Matrices: Monochromatic Irradiation Experiments and DFT Calculations
5. Hydrogen Bonding in ROH:R‘OH (R, R‘ = H, CH3, C2H5) Heterodimers: Matrix-Dependent Structure and Infrared-Induced Isomerization
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