A microstructure for detecting the stress distribution in thin coatings deposited on to silicon substrates
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference20 articles.
1. Stress;Maissel,1970
2. A measurement of intrinsic SiO2 film stress resulting from low temperature thermal oxidation of Si;Kobeda;J. Vac. Sci. Technol.,1986
3. A technique for the determination of stress in thin films;Bromley;J. Vac. Sci. Technol.,1983
4. Stress measurement in thin films by geometrical optics;Rossnagel;J. Vac. Sci. Technol.,1982
5. A simple technique for the determination of mechanical strain in thin films with applications to polysilicon;Guckel;J. Appl. Phys.,1985
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