MOCVD routes to Tl-2212/MgO/Tl-2212 trilayers — preliminary observations on growth and microstructural/electrical properties-Reference-Cited by-同舟云学术

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MOCVD routes to Tl-2212/MgO/Tl-2212 trilayers — preliminary observations on growth and microstructural/electrical properties

Published:1997-04 Issue:1-2 Volume:251 Page:328-331
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Hinds B.J.,McNeely R.J.,Chen J.,Dias C.,Studebaker D.L.,Marks T.J.,Hogan T.P.,Schindler J.L.,Kannewurf C.R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference14 articles.

1. Thin‐film multilayer interconnect technology for YBa2Cu3O7−x

2. TICaBaCuO high Tc superconducting microstrip ring resonators designed for 12 GHz

3. presentation at the 1995 MRS Spring Meeting;Myers,1995

4. MOCVD Routes to Tl2Ba2Can-1CunO4+2nSuperconductor and Dielectric Insulator Thin Films

5. Materials for superconducting electronics: In situ growth of PrGaO3 thin films by metalorganic chemical vapor deposition

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stability Study of a Magnesium β-Diketonate As Precursor for Chemical Vapor Deposition of MgO;Chemistry of Materials;2011-02-08

2. Polydentate Amines as CVD Precursor Ancillary Ligands. Epitaxial MgO Thin-Film Growth Using a Highly Volatile, Thermally and Air-Stable Magnesium Precursor;Chemical Vapor Deposition;2000-08

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