Enhancement of process efficacy using seed plasma in pulsed high-voltage glow-discharge plasma implantation
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy
Reference16 articles.
1. Ion Implantation;Ryssel,1986
2. Ion Implantation Technology;Ziegler,1992
3. Plasma source ion‐implantation technique for surface modification of materials
4. Handbook of Plasma Immersion Ion Implantation and Deposition;Anders,2000
5. Overview of plasma source ion implantation research at University of Wisconsin–Madison
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