Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing-Reference-Cited by-同舟云学术

Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing

Published:2013-10 Issue:14 Volume:40 Page:5688-5693
ISSN:0957-4174
Container-title:Expert Systems with Applications
language:en
Short-container-title:Expert Systems with Applications

Author:

Jeong Young-Seon,Kim Byungwhan,Ko Young-Don

Publisher

Elsevier BV

Subject

Artificial Intelligence,Computer Science Applications,General Engineering

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5. On-line monitoring when the process yield a linear profile;Kang;Journal of Quality Technology,2000

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