Washing kinetics of pollution-preventing lithographic inks-Reference-Cited by-同舟云学术

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Washing kinetics of pollution-preventing lithographic inks

Published:2000-05 Issue:10 Volume:55 Page:1921-1923
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Nair Sankar,Bhaskarwar Ashok N

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference4 articles.

1. Pollution-preventing lithographic inks;Bhaskarwar;Chemical Engineering Science,1997

2. Pennaz, T. J. (1994a). Ink composition and recovery. U.S. Patent 5,308,390 (May 3) and 5,338,351 (August 16).

3. Pennaz, T. J. (1994b). Development of a VOC-free lithographic printing system. TAGA Proceedings, pp. 324–338.

4. Pennaz, T. J. & Schacht, P.F. (1994). Ink composition. U.S. Patent 5,353,366 (October 11).

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pollution preventing microemulsion inks;Chemical Engineering Science;2005-03

2. Pollution-preventing anionic lithographic inks;Journal of Hazardous Materials;2003-12

3. Washing of Pollution-Preventing Lithographic Inks from a Roller Drum;Industrial & Engineering Chemistry Research;2003-09-26

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