Estimation of process-induced variability in SiGe-GAA-NWTFET to improve reliability

Author:

Singh SadhanaORCID,Chaudhary Tarun

Publisher

Elsevier BV

Reference18 articles.

1. Impact of process variations on the vertical silicon nanowire tunneling FET (TFET);Chen;Int. J. Electron. Commun. Eng.,2013

2. InAs/Si hetero-junction nanotube tunnel transistors;Hanna;Sci. Rep.,2015

3. Nanowire gate all around-TFET-based biosensor by considering ambipolar transport;Reddy;Appl. Phys. A,2021

4. Study of random variation in germanium-source vertical tunnel FET;Lee,2016

5. S.Singh and T.Chaudhary, “Gate-all-around nanowire TFET with heterojunction and core insulator: design and analysis”, in ECS Journal of Solid State Science and Technology, doi: 10.1149/2162-8777/ad0d9c..

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