Performance analysis for 263 nm AlGaN DUV EELD by different EBL techniques-Reference-Cited by-同舟云学术

Performance analysis for 263 nm AlGaN DUV EELD by different EBL techniques

Published:2023-06 Issue: Volume:281 Page:170828
ISSN:0030-4026
Container-title:Optik
language:en
Short-container-title:Optik

Author:

Rehman Hameed Ur,Niass Mussaab I.,Wang Fang^ORCID,Liu Yuhuai^ORCID

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference29 articles.

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