Author:
Zhai Ai-Ping,Cao Yi-Ping,Chen Bin,Cai Dongmei,Wei Hongye
Funder
863 National Plan Foundation of China
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Pupil-fill imperfections and their effect on lithography;Renwick;Proc. SPIE,2003
2. M. Chandhok, E.M. Panning, B.J. Rice, Adjustment of distance between source plasma and mirrors to change partial coherence, US Patent# 7,208,747 B2 (April 24, 2007).
3. Towards 280nm i-line random logic lithography with off-axis illumination and optical proximity correction;Grodnensky;J. Vac. Sci. Technol. B,1997
4. 1996 optical/laser microlithography. Impact of local partial coherence variations on exposure tool performance;Borodovsky;Proc. SPIE,1995
5. Pupil illumination: in-situ measurement of partial coherence;Kirk;Proc. SPIE,1998
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献