Fabrication and measurement of low polarization anti-reflection coating at 248 nm-Reference-Cited by-同舟云学术

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Fabrication and measurement of low polarization anti-reflection coating at 248 nm

Published:2013-07 Issue:13 Volume:124 Page:1441-1444
ISSN:0030-4026
Container-title:Optik
language:en
Short-container-title:Optik

Author:

Li Yanghui,Shen Weidong,Zhang Yueguang,Liu Xu

Funder

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

Zhejiang Provincial Natural Science Foundation

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference12 articles.

1. Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets;Liao;Opt. Express,2011

2. Fourth- and sixth-order polarization aberrations of antireflection-coated optical surfaces;Azzam;Opt. Lett.,2001

3. Coating-induced wave-front aberrations—on-axis astigmatism and chromatic aberration in all-reflecting systems;Reiley;Appl. Opt.,1994

4. Nanostructure and optical properties of fluoride films for high-quality DUV/VUV optical components;Schröder;Proc. SPIE,2005

5. Optical characterization of materials desposited by different processes: the LaF3 in the UV–visible region;Bosch;Proc. SPIE,2000

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