Laser Induced Damage Threshold of Ta2O5 and Ta2O5/SiO2 Films at 532 and 1064 nm

Author:

Kumar Sunil,Shankar AjayORCID,Kishore Nawal,Mukherjee C.,Kamparath Rajiv,Thakur Sudhakar

Funder

University Grants Commission

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Effects of deposition parameters on laser-induced damage threshold of Ta2O5 films;Cheng;Opt. Laser Technol.,2010

2. Optical properties and damage thresholds of dielectric UV/VUV-coatings deposited by conventional evaporation, IAD and ISB;Kolbe;Proc. SPIE. Int. Soc. Opt. Eng.,1991

3. Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2–SiO2 high reflector;Yuan;J. Opt. Soc. Am. B,2007

4. Comparison of different technologies for high quality optical coating;Flory;Proc. SPIE Int. Soc. Opt. Eng.,1990

5. Laser damage studies of tantalam and zirconia sol–gel coatings;Spriggs;Proc. SPIE Int. Soc. Opt. Eng.,1996

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