Uniform ALD deposition of Pt nanoparticles within 1D anodic TiO2 nanotubes for photocatalytic H2 generation
Author:
Funder
European Research Council
DFG
Ministry of Youth Education and Sports of the Czech Republic
Publisher
Elsevier BV
Subject
Electrochemistry
Reference45 articles.
1. Electrochemical photolysis of water at a semiconductor electrode;Fujishima;Nature,1972
2. One-dimensional titanium dioxide nanomaterials: nanotubes;Lee;Chem. Rev.,2014
3. Titanium dioxide photocatalysis;Fujishima;J. Photochem. Photobiol. C Photchem. Rev.,2000
4. A review of photocatalysis using self-organized TiO2 nanotubes and other ordered oxide nanostructures;Paramasivam;Small,2012
5. Decoration of growing TiO2 nanotubes and formation of a high-efficiency photocatalyst for H2 production;Lee;Adv. Mater.,2013
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