Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study-Reference-Cited by-同舟云学术

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Electrochemical properties of stoichiometric RuN film prepared by rf-magnetron sputtering: A preliminary study

Published:2014-12 Issue: Volume:49 Page:9-13
ISSN:1388-2481
Container-title:Electrochemistry Communications
language:en
Short-container-title:Electrochemistry Communications

Author:

Rosestolato Davide,Battaglin Giancarlo,Ferro Sergio^ORCID

Publisher

Elsevier BV

Subject

Electrochemistry

Reference16 articles.

1. Electrochemical oxidation behavior of titanium nitride based electrocatalysts under PEM fuel cell conditions;Avasarala;Electrochim. Acta,2010

2. Electrochemical capacitance performance of titanium nitride nanoarray;Xie;Mater. Sci. Eng. B,2013

3. Preparation and electrochemical hydrogen storage of boron nitride nanotubes;Chen;J. Phys. Chem. B,2005

4. Platinum group metal nitrides and carbides: synthesis, properties and simulation;Ivanovskii;Russ. Chem. Rev.,2009

5. Thermal stability of nitride thin films;Hultman;Vacuum,2000

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