Characterisation of nickel silicide thin films by spectroscopy and microscopy techniques
Author:
Publisher
Elsevier BV
Subject
Cell Biology,Structural Biology,General Physics and Astronomy,General Materials Science
Reference12 articles.
1. Silicide phase formation in Ni/Si system: depth-resolved positron annihilation and Rutherford backscattering study;Abhaya;J. Appl. Phys.,2006
2. Silicidation in Ni/Si thin film system investigated by X-ray diffraction and Auger electron spectroscopy.;Abhaya;Appl. Surf. Sci.,2007
3. Composition analysis of nickel silicide formed from evaporated and sputtered nickel for microsystem devices;Bhaskaran;Electron. Lett.,2007
4. Comparison of TiSi2, CoSi2, and NiSi for thin-film silicon-on-insulator applications;Chen;J. Electrochem. Soc.,1997
5. Algorithms for the rapid simulation of Rutherford backscattering spectra;Doolittle;Nucl. Instrum. Methods Phys. Res., Sect. B: Beam Interact. Mater. Atoms,1985
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Microstructure and Properties of Thin-Film Submicrostructures Obtained by Rapid Thermal Treatment of Nickel Films on Silicon;Surfaces;2024-03-27
2. Broad spectral response to photon energy unlimited by Schottky barrier from NiSi/Si junction;Optics & Laser Technology;2023-11
3. Efficient and Stable Silicon Microwire Photocathodes with a Nickel Silicide Interlayer for Operation in Strongly Alkaline Solutions;ACS Energy Letters;2018-04-09
4. Fabrication of Lead-Free Piezoelectric (K, Na)NbO3Thin Film on Nickel-Based Electrodes;Journal of Microelectromechanical Systems;2016-04
5. Nickel-Palladium Nanoparticles for Nonenzymatic Methanol Detection;Analytical Letters;2012-07-15
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3