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Sputter Processing

Published:2012 Issue: Volume: Page:55-88
ISSN:
Container-title:Handbook of Thin Film Deposition
language:
Short-container-title:

Author:

Simon Andrew H.

Publisher

Elsevier

Reference72 articles.

1. Physical Vapor Deposition of Thin Films;Mahan,2000

2. Handbook of Physical Vapor Deposition (PVD) Processing;Mattox,2010

3. Sputter deposition for semiconductor manufacturing

4. Thin film deposition with physical vapor deposition and related technologies

5. Sputtering and sputter deposition;Rossnagel,2002

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of pulse time offset between Cr and Zr dual cathodes in closed-magnetic-field unipolar high-power impulse magnetron sputtering;Surface and Coatings Technology;2024-08

2. Monte Carlo simulations of W-Ta alloys under helium ion bombardment;Fusion Engineering and Design;2024-08

3. Sputtered zirconium based metallic glassy thin films onto electrospun PCL nanofibrous scaffolds for enriching bioactivity;Materials Chemistry and Physics;2024-08

4. Smart Ecological Points, a Strategy to Face the New Challenges in Solid Waste Management in Colombia;Sustainability;2024-06-21

5. Monte Carlo simulations of W-Re alloys under helium ion bombardment;Physica Scripta;2024-06-19

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